![]() ![]() ![]() Junction transistors were relatively bulky devices that were difficult to manufacture on a mass-production basis, which limited them to a number of specialised applications. However, the JFET still had issues affecting junction transistors in general. Following Shockley's theoretical treatment on the JFET in 1952, a working practical JFET was built by George C. The static induction transistor (SIT), a type of JFET with a short channel, was invented by Japanese engineers Jun-ichi Nishizawa and Y. A JFET was first patented by Heinrich Welker in 1945. The first FET device to be successfully built was the junction field-effect transistor (JFET). In the course of trying to understand the mysterious reasons behind their failure to build a working FET, it led to Bardeen and Brattain instead inventing the point-contact transistor in 1947, which was followed by Shockley's bipolar junction transistor in 1948. Shockley initially attempted to build a working FET, by trying to modulate the conductivity of a semiconductor, but was unsuccessful, mainly due to problems with the surface states, the dangling bond, and the germanium and copper compound materials. ![]() The transistor effect was later observed and explained by John Bardeen and Walter Houser Brattain while working under William Shockley at Bell Labs in 1947, shortly after the 17-year patent expired. The concept of a field-effect transistor (FET) was first patented by the Austro-Hungarian born physicist Julius Edgar Lilienfeld in 1925 and by Oskar Heil in 1934, but they were unable to build a working practical semiconducting device based on the concept. Julius Edgar Lilienfeld proposed the concept of a field-effect transistor in 1925. ![]()
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